Low Scattering Substrate Synthetic Fused Silica 50.0mm Diamter 5mm Thick λ/10

OPSQSP-50C05-10-5

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We can provide special optical polishing service for optics or wedge substrate that achieve surface roughness of <0.2nm (Ra). These low scattering substrates are in high demand for high power laser and X-ray applications.

Details

◦Use a wedged substrate for a beamsplitter to prevent effects of back reflection.
◦CaF₂ (calcium fluoride) and MgF₂(magnesium fluoride) are mainly used in UV and IR for its high transmittance.
◦Our highly technical processing yields low surface roughness (microscopic irregularities) and precision surface accuracy (flatness of whole surface).

More Information

More Information
Name	Low Scattering Substrate Synthetic Fused Silica 50.0mm Diamter 5mm Thick λ/10
Weight	0.0220kgs
Standard Coatings Available	Yes
Guide	Wedged substrates have marked with an arrow indicating the direction of front surface at the thickest thickness point.
Remark	-
Attention	The low scattering substrates are uncoated; the reflectance from the surface is 2.5% to 4%. If using wedge substrate for transmission application, the beam will be deviate approximately 0.5 degrees. The CaF₂ substrate surface can be easily scratched. Do not use contact cleaning, please use air-blow for dirt cleaning. The CaF₂ and the MgF₂ substrates get rough under high temperature and high humidity environment. Stock them in dry optical cabinet after use.
Diameter φD	50mm
Material	Synthetic fused silica
Material	Synthetic fused silica
Surface roughness	＜0.2nm(Ra)
Type	Optical Parallel
Diameter φD	φ50mm
Thickness t	5mm
Surface Flatness	λ/10
Parallelism	＜5″
Surface Quality (Scratch-Dig)	10−5

In stock

SKU

OPSQSP-50C05-10-5

$525.00

Low Scattering Substrate Synthetic Fused Silica 50.0mm Diamter 5mm Thick λ/10

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