Low Scattering Substrate Synthetic Fused Silica 30.0mm Diamter 3mm Thick λ/10
OPSQSP-30C03-10-5
We can provide special optical polishing service for optics or wedge substrate that achieve surface roughness of <0.2nm (Ra). These low scattering substrates are in high demand for high power laser and X-ray applications.
◦Use a wedged substrate for a beamsplitter to prevent effects of back reflection.
◦CaF2 (calcium fluoride) and MgF2(magnesium fluoride) are mainly used in UV and IR for its high transmittance.
◦Our highly technical processing yields low surface roughness (microscopic irregularities) and precision surface accuracy (flatness of whole surface).
◦CaF2 (calcium fluoride) and MgF2(magnesium fluoride) are mainly used in UV and IR for its high transmittance.
◦Our highly technical processing yields low surface roughness (microscopic irregularities) and precision surface accuracy (flatness of whole surface).
Name | Low Scattering Substrate Synthetic Fused Silica 30.0mm Diamter 3mm Thick λ/10 |
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Weight | 0.0050kgs |
Standard Coatings Available | Yes |
Guide |
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Remark | - |
Attention |
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Diameter φD | 30mm |
Material | Synthetic fused silica |
Material | Synthetic fused silica |
Surface roughness | <0.2nm(Ra) |
Type | Optical Parallel |
Diameter φD | φ30mm |
Thickness t | 3mm |
Surface Flatness | λ/10 |
Parallelism | <5″ |
Surface Quality (Scratch-Dig) | 10−5 |
Out of stock
SKU
OPSQSP-30C03-10-5
€264.00
We can provide special optical polishing service for optics or wedge substrate that achieve surface roughness of <0.2nm (Ra). These low scattering substrates are in high demand for high power laser and X-ray applications.