Low Scattering Substrate Synthetic Fused Silica 50.0mm Diamter 5mm Thick λ/10
OPSQSP-50C05-10-5
We can provide special optical polishing service for optics or wedge substrate that achieve surface roughness of <0.2nm (Ra). These low scattering substrates are in high demand for high power laser and X-ray applications.
◦Use a wedged substrate for a beamsplitter to prevent effects of back reflection.
◦CaF2 (calcium fluoride) and MgF2(magnesium fluoride) are mainly used in UV and IR for its high transmittance.
◦Our highly technical processing yields low surface roughness (microscopic irregularities) and precision surface accuracy (flatness of whole surface).
◦CaF2 (calcium fluoride) and MgF2(magnesium fluoride) are mainly used in UV and IR for its high transmittance.
◦Our highly technical processing yields low surface roughness (microscopic irregularities) and precision surface accuracy (flatness of whole surface).
| Name | Low Scattering Substrate Synthetic Fused Silica 50.0mm Diamter 5mm Thick λ/10 |
|---|---|
| Weight | 0.0220kgs |
| Standard Coatings Available | Yes |
| Guide |
|
| Remark | - |
| Attention |
|
| Diameter φD | 50mm |
| Material | Synthetic fused silica |
| Material | Synthetic fused silica |
| Surface roughness | ＜0.2nm(Ra) |
| Type | Optical Parallel |
| Diameter φD | φ50mm |
| Thickness t | 5mm |
| Surface Flatness | λ/10 |
| Parallelism | ＜5″ |
| Surface Quality (Scratch-Dig) | 10−5 |
In stock
SKU
OPSQSP-50C05-10-5
€471.40
We can provide special optical polishing service for optics or wedge substrate that achieve surface roughness of <0.2nm (Ra). These low scattering substrates are in high demand for high power laser and X-ray applications.
